The effect of substrate clamping on the paraelectric to antiferroelectric phase transition in Nd-doped BiFeO3 thin films

Article history: Received 18 May 2016 Received in revised form 23 September 2016 Accepted 3 October 2016 Available online 4 October 2016 Thin films were deposited on Pt/Ti/SiO2/Si substrates using pulsed laser deposition from a target with a composition (Bi0.825Nd0.175Fe0.97Ti0.03O3) with 5 mol% excess Bi2O3 within the antiferroelectric (AFE) region of the NdFeO3-BiFeO3 phase diagram. However, Raman spectroscopy and transmission electron microscopy (TEM) revealed that films consisted of a mosaic microstructure in which (AFE), ferroelectric (FE) and paraelectric (PE) phases coexisted. Variation in the spatial distribution of Nd is typically greater in bulk ceramics than in thin films and therefore, the absence of single phase AFE cannot be attributed to local changes in composition. Instead, it is proposed that clamping due tomismatch in thermal expansion coefficient with the substrate suppresses the large volume change associatedwith the PE-FE and PE-AFE transition in bulk and its absence in the thin film prevents an avalanche-like transition throughout grains,which in bulk sustains single phaseAFE, irrespective of local deviations in the Nd concentration. © 2016 The Authors. Published by Elsevier B.V. This is an open access article under the CC BY license (http://creativecommons.org/licenses/by/4.0/).